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Extreme Ultraviolet Lithography (Hardcover)

Author: Wu, Banqiu

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Product Overview

Explains the most promising innovation in microlithography. today. .

This landmark resource provides the first complete guide to. extreme ultraviolet lithography (EUVL), covering the latest scientific. theory, processing methods, applications, and future. directions. Edited by two renowned EUVL experts, the reference. contains contributions by prominent engineers at leading semiconductor. manufacturers such as Intel and ASM Lithography.. Designed to help you optimize. EUVL, Extreme Ultraviolet Lithography covers EUV. lithography tools, EUV printer, EUV sources, multilayer EUV, EUV. optics, defect control, resist, mask techniques, and more.


Publisher McGraw-Hill Professional Publishing
Mfg Part# 9780071549189
SKU 208666428
Format Hardcover
ISBN10 0071549188
Release Date 5/1/2009
Product Attributes
Book Format Hardcover
Number of Pages 0465
Publisher McGraw-Hill Professional Publishing
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